Nb-10Zr alloys have high melting points, excellent high-temperature stability, corrosion resistance, and good thin-film deposition properties. Using magnetron sputtering, thin films of the Nb-Zr alloy can be deposited onto the surfaces of glass, semiconductor wafers, metal components, and other substrates to improve their corrosion resistance, high-temperature resistance, wear resistance, and surface stability.
Targets made of Nb-10Zr alloy can be custom-manufactured to meet customer specifications regarding size, purity, chemical composition, surface roughness, substrate structure, and sputtering equipment. Flat, round, and rotating targets are available.
90Nb-10Zr alloy targets are used for coating glass and are available in flat and rotating configurations. Nb-10Zr alloy targets can also be used in PVD, magnetron sputtering, and for depositing thin films in semiconductors, displays, and optical components.
Key characteristics of Nb-10Zr targets:
- High-Temperature Stability
- Excellent corrosion resistance
- Excellent performance in thin-film deposition
- Suitable for PVD and magnetron sputtering
- Ability to customize target sizes
